chemical vapor deposition method meaning in Chinese
化学气相淀积工艺
Examples
- The influence of substrate materials on properies of primary diamond like carbon films prepared by direct photo chemical vapor deposition method
衬底材料对直接光化学汽相淀积类金刚石碳膜成膜初期的影响 - The growth of carbon nanotubes at low temperature was studied by thermal chemical vapor deposition and plasma chemical vapor deposition methods
本论文分别以化学气相沉积法及电浆辅助化学气相沉积法探讨于低温下合成奈米碳管。 - Microwave plasma chemical vapor deposition ( mpcvd ) , a kind of chemical vapor deposition method with low temperature ， low intensity of pressure and clearance ， is commonly used for the growth of diamond thin films
微波等离子体增强化学气相沉积法（ mpcvd法）是众多低气压下激活cvd工艺方法的一种，也是目前在国内外比较流行的制备金刚石薄膜的工艺方法之一。 - ( 2 ) diamond - like carbon films could be fabricated by plasma enhanced chemical vapor deposition method too , the surface morphology of the films was good , but the films had very big internal stress , which could be decreased by adding proper nitrogen gas in work chamber
( 2 )用等离子体增强化学气象沉积技术也能制备类金刚石膜。优点是用这种方法制备的薄膜表面形貌得到了一定的改善，但内应力较大，通过加入适量的氮气可以改善一些。 - Carbon nanofibers , well - aligned carbon nanorods and alignend carbon nanotubes could be synthesized on the porous aao template with catalysts by chemical vapor deposition method . the morphology of co and fe - co alloys deposited in the template and the microstructure of the carbon nanostructures synthesized on the template were systematically investigated by means of sem , tem , eds and raman spectrum
采用扫描电子显微镜( sem ) 、透射电子显微镜( tem ) 、能谱仪( eds )和喇曼光谱( raman )等对在多孔aao模板上电沉积得到的co和fe ? co合金催化剂的表面形貌以及在多孔aao模板上制备得到的碳纳米结构进行了系统的观察分析。